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- W2030753610 abstract "We report the deposition of highly stable two-layer TiO2/SiO2 anti-reflection (AR) coatings deposited using ion-assisted deposition (IAD). We have measured the variation of refractive index with ion energy and beam current and found that this increases with the ion energy. This result, in conjunction with Auger electron spectroscopy measurements, implies that the IAD process densifies the deposited films without changing their stoichiometry. Wet etch rate measurements have confirmed that film porosity is correspondingly reduced. Anti-reflection coatings have been deposited on InP substrates and reflectivities less than 0.1% have been obtained. The long-term stability has been monitored over several hundred days and large improvements have been observed when IAD is used. We have also measured the changes in refractive index of single layer films immediately after deposition when the vacuum chamber is vented to atmosphere and no changes are evident in the IAD films. All the evidence implies that changes in non-IAD anti-reflection coatings are a result of a slow moisture ingression into the uppermost SiO2 layer. We could not however simulate this by attempts to accelerate water ingression into non-IAD AR coatings." @default.
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- W2030753610 title "Improvements in the wavelength stability of evaporated TiO2/SiO2 anti-reflection coatings by ion assistance∗" @default.
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