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- W2030754877 abstract "A polarization-modulated ellipsometer was constructed to investigate the optical properties of surfaces and transparent thin films. In the latter case, the measurement gives a unique determination of the index of refraction n and film thickness t. Using a HeNe laser light source, the beam was focused to a spot size of 50 μm. By stepping the sample across the focal point of the laser beam in both x and y directions, the spatial uniformity could be measured. This apparatus was particularly useful for optical profiling laser-annealed oxide films grown on GaAs. A new technique for laser annealing native oxides on GaAs produced the need for observing spatial structure with spatial resolution of less than 100 μm. Here the laser pulse produced a "crater" in the oxide due to localized healing and subsequent densification of the film (Figs. 1 & 2). This technique allows profiling of film index of refraction and thickness across the laser irradiated area--about 2 to 3 mm in our case. A number of applications in microelectronics are suggested." @default.
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- W2030754877 date "1981-12-30" @default.
- W2030754877 modified "2023-09-23" @default.
- W2030754877 title "<title>Scanning Microellipsometer For The Spatial Characterization Of Thin Films</title>" @default.
- W2030754877 doi "https://doi.org/10.1117/12.932075" @default.
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