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- W2031130954 abstract "A novel processing plasma in the VHF region (144 MHz band) is described. Optical emission spectroscopy has been employed as a diagnostic tool of the plasma. The advantage of the VHF plasma is enhanced in the ECR mode by applying magnetic field. ECR plasma with a large area uniformity has been obtained at a magnetic field of as low as 51 G. By using the ECR mode, the discharge condition has been significantly expanded to a lower pressure range and lower power density region. The ECR-VHF plasma has been successfully applied for the deposition of amorphous silicon films." @default.
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- W2031130954 date "1989-10-01" @default.
- W2031130954 modified "2023-09-26" @default.
- W2031130954 title "Generation of Electron Cyclotron Resonance Plasma in the VHF Band" @default.
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- W2031130954 doi "https://doi.org/10.1143/jjap.28.l1860" @default.
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