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• W2031298982 abstract "It becomes increasingly important to have an integrated process for Extreme UltraViolet (EUV) mask fabrication in order to meet all the requirements for the 32 nm technology node and beyond. Intel Corporation established the EUV mask pilot line by introducing EUV-specific tool sets while capitalizing on the existing photomask technology and utilizing the standard photomask equipment and processes in 2004. Since then, significant progress has been made in many areas including absorber film deposition, mask patterning optimization, mask blank and patterned mask defect inspection, pattern defect repair, and EUV mask reflectivity metrology. In this paper we will present the EUV mask process with the integrated solution and the results of the mask patterning process, Ta-based in-house absorber film deposition, absorber dry etch optimization, EUV mask pattern defect inspection, absorber defect repair, and mask reflectivity performance. The EUV resist wafer print using the test masks that are fabricated in the EUV mask pilot line will be discussed as well." @default.
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• W2031298982 date "2006-05-04" @default.
• W2031298982 modified "2023-10-15" @default.
• W2031298982 title "EUV mask process development and integration" @default.
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• W2031298982 doi "https://doi.org/10.1117/12.681839" @default.
• W2031298982 hasPublicationYear "2006" @default.
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