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• W2031485685 abstract "Cubic boron nitride (c-BN) thin films have been deposited on Si, Ni, Ni-coated Si and stainless steel substrates by a hot filament assistant rf plasma chemical vapor deposition (CVD). The samples were characterized by Fourier transformation infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS) measurements. By optimizing the deposition conditions, the BN films containing a large amount of cubic phase were obtained. It was shown that substrate plays an important role in the quality of the resulting films. The stoichiometric film with a content over 85% of c-BN phase was deposited on Ni substrate. On Si substrate, c-BN film with good adhesion and quality was obtained by using a sputtered Ni thin film as a buffer layer." @default.
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• W2031485685 date "1998-07-01" @default.
• W2031485685 modified "2023-09-27" @default.
• W2031485685 title "Characterization of cubic boron nitride thin films grown on different substrates" @default.
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• W2031485685 doi "https://doi.org/10.1016/s0167-577x(98)00027-5" @default.
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