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- W2031506795 abstract "The temperature dependence of lattice disorder created in Si by 40-keV Sb ions was studied by energy analysis of the yield of backscattered 1-MeV He ions incident along 〈111〉 and 〈110〉 axes. Doses of ∼ 1 × 1013 Sb ions/cm2 were used so that the disorder level was below that representing an amorphous layer. The disorder per incident ion decreases strongly with implant temperature above 50°C. This is approximately 100°C lower than the region of corresponding decrease in the anneal of a low-dose room-temperature implantation. For implantation temperatures less than 50°C, the disorder per ion was only mildly temperature-dependent." @default.
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- W2031506795 date "1969-01-01" @default.
- W2031506795 modified "2023-09-29" @default.
- W2031506795 title "TEMPERATURE DEPENDENCE OF LATTICE DISORDER CREATED IN Si BY 40 keV Sb IONS" @default.
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- W2031506795 doi "https://doi.org/10.1063/1.1652655" @default.
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