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- W2031522011 abstract "A scanning electron microscope (SEM) has been modified for direct-write electron beam lithography. The instrument has the capability to automatically align with the features patterned by optical lithography and exposure the features requiring the finest linewidth with the electron beam. The main application for the instrument is one the process line for fabricating high electron mobility transistors (HEMTs) in GaAs monolithic microwave integrated circuits (MMICs). The high frequency performance of the HEMTs is critically dependent on the length of the gate electrode and the placement of this electrode between the source and drain electrodes. All of the mask layers for a MMIC except the gate layer are exposed using optical lithography, as it provides the required linewidth with high throughput. The sample containing the partially fabricated HEMTs is loaded in the instrument and is positioned at each HEMT in sequence in order to acquire an image of the source and drain electrodes. This image is correlated with a reference image of the HEMT to determine its precise location for subsequent exposure of the gate electrode by the electron beam. The instrument is able to achieve an alignment accuracy of 80 nm and has been used to expose features with linewidths less than 100 nm. As images of the device are used for alignment, the instrument does not require alignment marks on the sample and is able to automatically compensate for positional errors caused by same stage and mask tolerances. As the full SEM functionality of the instrument is retained, it may also be used to inspect the results of the lithography." @default.
- W2031522011 created "2016-06-24" @default.
- W2031522011 creator A5012705021 @default.
- W2031522011 creator A5073464528 @default.
- W2031522011 date "1999-04-28" @default.
- W2031522011 modified "2023-10-08" @default.
- W2031522011 title "<title>Direct-write electron beam lithography automatically aligned with optical lithography for device fabrication</title>" @default.
- W2031522011 doi "https://doi.org/10.1117/12.346885" @default.
- W2031522011 hasPublicationYear "1999" @default.
- W2031522011 type Work @default.
- W2031522011 sameAs 2031522011 @default.
- W2031522011 citedByCount "1" @default.
- W2031522011 crossrefType "proceedings-article" @default.
- W2031522011 hasAuthorship W2031522011A5012705021 @default.
- W2031522011 hasAuthorship W2031522011A5073464528 @default.
- W2031522011 hasConcept C105487726 @default.
- W2031522011 hasConcept C119599485 @default.
- W2031522011 hasConcept C120665830 @default.
- W2031522011 hasConcept C121332964 @default.
- W2031522011 hasConcept C127413603 @default.
- W2031522011 hasConcept C136525101 @default.
- W2031522011 hasConcept C142181693 @default.
- W2031522011 hasConcept C142724271 @default.
- W2031522011 hasConcept C147120987 @default.
- W2031522011 hasConcept C159985019 @default.
- W2031522011 hasConcept C162057924 @default.
- W2031522011 hasConcept C165801399 @default.
- W2031522011 hasConcept C171250308 @default.
- W2031522011 hasConcept C172385210 @default.
- W2031522011 hasConcept C17525397 @default.
- W2031522011 hasConcept C192562407 @default.
- W2031522011 hasConcept C200274948 @default.
- W2031522011 hasConcept C204223013 @default.
- W2031522011 hasConcept C204787440 @default.
- W2031522011 hasConcept C26771246 @default.
- W2031522011 hasConcept C2779227376 @default.
- W2031522011 hasConcept C49040817 @default.
- W2031522011 hasConcept C520434653 @default.
- W2031522011 hasConcept C53524968 @default.
- W2031522011 hasConcept C62520636 @default.
- W2031522011 hasConcept C71924100 @default.
- W2031522011 hasConcept C95312477 @default.
- W2031522011 hasConceptScore W2031522011C105487726 @default.
- W2031522011 hasConceptScore W2031522011C119599485 @default.
- W2031522011 hasConceptScore W2031522011C120665830 @default.
- W2031522011 hasConceptScore W2031522011C121332964 @default.
- W2031522011 hasConceptScore W2031522011C127413603 @default.
- W2031522011 hasConceptScore W2031522011C136525101 @default.
- W2031522011 hasConceptScore W2031522011C142181693 @default.
- W2031522011 hasConceptScore W2031522011C142724271 @default.
- W2031522011 hasConceptScore W2031522011C147120987 @default.
- W2031522011 hasConceptScore W2031522011C159985019 @default.
- W2031522011 hasConceptScore W2031522011C162057924 @default.
- W2031522011 hasConceptScore W2031522011C165801399 @default.
- W2031522011 hasConceptScore W2031522011C171250308 @default.
- W2031522011 hasConceptScore W2031522011C172385210 @default.
- W2031522011 hasConceptScore W2031522011C17525397 @default.
- W2031522011 hasConceptScore W2031522011C192562407 @default.
- W2031522011 hasConceptScore W2031522011C200274948 @default.
- W2031522011 hasConceptScore W2031522011C204223013 @default.
- W2031522011 hasConceptScore W2031522011C204787440 @default.
- W2031522011 hasConceptScore W2031522011C26771246 @default.
- W2031522011 hasConceptScore W2031522011C2779227376 @default.
- W2031522011 hasConceptScore W2031522011C49040817 @default.
- W2031522011 hasConceptScore W2031522011C520434653 @default.
- W2031522011 hasConceptScore W2031522011C53524968 @default.
- W2031522011 hasConceptScore W2031522011C62520636 @default.
- W2031522011 hasConceptScore W2031522011C71924100 @default.
- W2031522011 hasConceptScore W2031522011C95312477 @default.
- W2031522011 hasLocation W20315220111 @default.
- W2031522011 hasOpenAccess W2031522011 @default.
- W2031522011 hasPrimaryLocation W20315220111 @default.
- W2031522011 hasRelatedWork W1983850620 @default.
- W2031522011 hasRelatedWork W2011474893 @default.
- W2031522011 hasRelatedWork W2016342374 @default.
- W2031522011 hasRelatedWork W2026852677 @default.
- W2031522011 hasRelatedWork W2053190549 @default.
- W2031522011 hasRelatedWork W2083302917 @default.
- W2031522011 hasRelatedWork W2085237633 @default.
- W2031522011 hasRelatedWork W2144086325 @default.
- W2031522011 hasRelatedWork W3023368811 @default.
- W2031522011 hasRelatedWork W3091884080 @default.
- W2031522011 isParatext "false" @default.
- W2031522011 isRetracted "false" @default.
- W2031522011 magId "2031522011" @default.
- W2031522011 workType "article" @default.