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• W2031543885 abstract "ABSTRACT Photoinjection of electrons into silicon dioxide in metal-oxide-semiconductor (MOS) capacitors with 3.5 eV light is shown to create interface states with no apparent hole trapping precursor. The creation rate of these interface states depends strongly upon whether injection is from the gate metal or the silicon substrate, and on the forming gas annealing sequence used to passivate growth-induced interface states. A mechanism involving electron-induced release of hydrogen in the oxide is consistent with some aspects of the data." @default.
• W2031543885 created "2016-06-24" @default.
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• W2031543885 date "1989-01-01" @default.
• W2031543885 modified "2023-09-27" @default.
• W2031543885 title "Creation of Interface States at the Silicon/Silicon Dioxide Interface by UV Light Without Hole Trapping" @default.
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• W2031543885 doi "https://doi.org/10.1557/proc-148-415" @default.
• W2031543885 hasPublicationYear "1989" @default.
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