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- W2031736206 abstract "Y 2 O 3 films were grown on SiO 2 -covered Si(111), and hydrogen-terminated Si(111) substrates at a temperature of 500°C by ultra-high vacuum ionized cluster beam deposition. The microstructures and growth behavior of these films have been investigated by transmission electron diffraction (TED) and high resolution transmission electron microscopy (HREM). The TED results show that the Y 2 O 3 grown on the SiO 2 -Si has the epitaxial relationship of (11-1) Y2O3 //(111) Si and [-110] Y2O3 //[-110] Si The film on the H-Si contains YSi 2-x and amorphous YSi x O layers at the interface, having the orientation relationship each other. For the YSi 2-x and the Si substrate, the relationship is (0001)YSi 2-x //(111)Si and [1-210]YSi 2-x //[-110]Si. For the Y 2 O 3 and the YSi 2-x the relationship is as follows: (11-1)Y 2 O 3 //(0001)YSi 2-x and [-110]Y 2 O 3 //[1-210]YSi 2-x ; (111)Y 2 O 3 //(0001)YSi 2-x and [-110]Y 2 O 3 //[1-210]YSi 2-x . The formation mechanism of the interfacial phases of SiO x , YSi x O y , and YSi 2-x are described. It is shown that the crystallinity of the Y 2 O 3 film on the SiO 2 -Si(111) is better than that of Y 2 O 3 on H-Si(111)." @default.
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- W2031736206 date "1999-08-01" @default.
- W2031736206 modified "2023-10-03" @default.
- W2031736206 title "Transmission Electron Microscope Structural Study of Y 2 O 3 Films Grown on Si(111) Substrates by Ultrahigh Vacuum Ionized Cluster Beam" @default.
- W2031736206 doi "https://doi.org/10.1149/1.1392046" @default.
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