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- W2031879969 abstract "PECVD is an attractive technique for depositing coatings of refractory optical materials because of the ability to control composition (to assure low absorption), the low substrate temperature required, and the high deposition rate attainable. Deposition processes have been established that achieve thin films with low absorption, low scatter, good thickness uniformity, and environmental durability. Multilayer dielectric- enhanced IR reflectance mirrors using a variety of silicon-based refractory materials have been fabricated and evaluated. Results of optical and physical characterizations and environmental testing will be presented.© (1995) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only." @default.
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- W2031879969 date "1995-07-14" @default.
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- W2031879969 title "<title>Development of plasma-enhanced CVD for multilayer mirror coatings <emph type=3>(Abstract Only)</emph></title>" @default.
- W2031879969 doi "https://doi.org/10.1117/12.213717" @default.
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