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- W2031976850 abstract "1.3 /spl mu/m-strained MQW BH LDs with a current blocking structure have been developed by selective MOVPE and a newly developed self-alignment process; we call these devices ASM (all selective MOVPE grown)-BH-LDs. The fabrication process, which completely eliminates semiconductor etching, is very promising to realize high-performance LDs with excellent uniformity and reproducibility. The light output power was remarkably improved by a factor of two, compared with previous selective MOVPE-LDs." @default.
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- W2031976850 date "1996-02-01" @default.
- W2031976850 modified "2023-09-24" @default.
- W2031976850 title "All selective MOVPE grown BH-LDs fabricated by the novel self-alignment process" @default.
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- W2031976850 doi "https://doi.org/10.1109/68.484233" @default.
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