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• W2032240023 abstract "We report the fabrication of metal-semiconductor-metal (MSM) photo detectors on silicon substrates with CoSi2 electrodes. The electrode patterns have been formed by ion beam synthesis applying maskless implantation with a cobalt focused ion beam. Implantation has been carried out with the substrate at room temperature and at 400 °C." @default.
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• W2032240023 date "1997-02-01" @default.
• W2032240023 modified "2023-09-26" @default.
• W2032240023 title "Fabrication of MSM detector structures on silicon by focused ion beam implantation" @default.
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• W2032240023 doi "https://doi.org/10.1016/s0167-9317(96)00186-4" @default.
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