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- W2032242885 abstract "It has been reported that some types of impurities severely degrade resist performance of chemically amplified resists. The effects of impurities on the processes of acid generation in the chemically amplified electron beam (EB) and X-ray resists have been studied by means of nanosecond pulse radiolysis. Amines, water, oxygen, alcohols, silanol and casting solvents were used as impurities. The effects of the impurities in the model solutions of chemically amplified resists (onium salt solutions in m-cresol) were measured using pyrene as an indicator of protonation and charge transfer reaction. The rate constants for the reactions of several kinds of impurities with proton adducts of m-cresol were obtained." @default.
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- W2032242885 date "1993-12-01" @default.
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- W2032242885 title "Effects of Impurities on Processes of Acid Generation in Chemically Amplified Resists for Electron Beam and X-Ray Lithography" @default.
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- W2032242885 doi "https://doi.org/10.1143/jjap.32.6049" @default.
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