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• W2032428504 abstract "A novel positive deep UV resist for KrF excimer laser lithography has been developed. The resist is composed of 1,7-bis(4-chlorosulfonyl phenyl)-4-diazo-3,5-heptanedione as the alkaline dissolution inhibitor and an alkali-soluble sytrene polymer as the main-polymer. 1,7-bis(4-chlorosulfonyl phenyl)-4-diazo-3,5-heptanedione has great capability of alkaline dissolution inhibition. High thermal stability and excellent photobleachability at 248 nm of the compound are also characterized. The alkali-soluble styrene polymer has a high transmittance of 70% in 1.0 μm thickness at 248 nm. The novel positive resist had an excellent property for dissolution kinetics and photobleaching. We achieved high aspect ratio half-micron pattern fabrication in 1.0 μm thickness using the new resist." @default.
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• W2032428504 date "1989-07-01" @default.
• W2032428504 modified "2023-10-03" @default.
• W2032428504 title "Novel positive deep UV resist for KrF excimer laser lithography" @default.
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• W2032428504 doi "https://doi.org/10.1002/pen.760291306" @default.
• W2032428504 hasPublicationYear "1989" @default.
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