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• W2032532518 endingPage "11NA08" @default.
• W2032532518 startingPage "11NA08" @default.
• W2032532518 abstract "Flux control of dust particles in a nanometer size range using dc bias voltage is discussed based on dust collection in a divertor simulator employed helicon hydrogen discharges. To discuss mechanisms of flux control, we have estimated etching rate of deposited dust particles due to hydrogen plasma irradiation and have measured current density toward the dc biased substrates. We have found the contribution of the etching can be negligible in a dc bias voltage V bias range between -50 and 70 V. Clear correlation between V bias dependence of current density and that of dust flux shows electrostatic force is one of important forces for controlling flux of dust particles." @default.
• W2032532518 created "2016-06-24" @default.
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• W2032532518 date "2013-11-01" @default.
• W2032532518 modified "2023-10-18" @default.
• W2032532518 title "Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates" @default.
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• W2032532518 doi "https://doi.org/10.7567/jjap.52.11na08" @default.
• W2032532518 hasPublicationYear "2013" @default.
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