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• W2032550208 abstract "ZnO films are deposited on (0 0 0 1) sapphire and quartz substrates using the off-axis reactive magnetron sputtering deposition. Based on film thickness measurements, three transport regions of sputtered particles are observed when films are deposited in the pressure regions of 5–150 mTorr. X-ray diffraction, scanning probes microscopy, and electrical measurements are also used to characterize these films. The full-width at half-maximum of θ-rocking curves for epitaxial films is less than 0.5°. In textured films, it rises to several degrees. The epitaxial films deposited at high pressure reveal a flat surface with some hexagonal facets. The density of hexagonal facets decreases when the growth pressure is reduced. The resistivity of these epitaxial films also depends on the growth pressures. A relationship between the pressure effects and film properties are discussed." @default.
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• W2032550208 date "2000-04-01" @default.
• W2032550208 modified "2023-10-06" @default.
• W2032550208 title "Pressure effects in ZnO films using off-axis sputtering deposition" @default.
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• W2032550208 doi "https://doi.org/10.1016/s0022-0248(99)00798-8" @default.
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