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- W2032555148 abstract "Four types of Mo-based ohmic contacts with a varied Al and Ti content are developed and investigated regarding the ohmic properties, surface morphology and edge acuity. It is found out that the Ti/Mo/Ti/Au metallization combines the lowest contact resistivity of 8.8×10−6 Ω.cm2 and low surface roughness of 3.8 nm. The presence of Al in the contact composition does not improve the electrical properties and the surface morphology. Its effect on these properties depends strongly on the Ti/Al ratio in the contact composition." @default.
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- W2032555148 date "2012-05-01" @default.
- W2032555148 modified "2023-09-25" @default.
- W2032555148 title "Dependence of the electrical and morphological properties on the Ti and Al content in Mo-based ohmic contacts for III–V nitrides" @default.
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- W2032555148 doi "https://doi.org/10.1109/miel.2012.6222856" @default.
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