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- W2032661179 abstract "The usage of phasefluid based stripping agents to remove photoresists from silicon substrates was studied. Due to their highly dynamic inner structure phasefluids offer a new working principle, they are penetrating layers through smallest openings and lift off the material from the surface. These non-aggressive stripping fluids were investigated regarding their cleaning efficiency as well as contamination behavior to enable usage in semiconductor and MEMS manufacturing. A general proof of concept for the usage of phasefluids in resist stripping processes is shown on silicon coupons and BKM’s are given for different resist types. In addition a baseline process on 12inch wafers has been developed and characterized in terms of metallic and ionic impurities and defect level." @default.
- W2032661179 created "2016-06-24" @default.
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- W2032661179 date "2014-03-27" @default.
- W2032661179 modified "2023-10-16" @default.
- W2032661179 title "Introduction of an innovative water based photoresist stripping process using intelligent fluids" @default.
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- W2032661179 doi "https://doi.org/10.1117/12.2048068" @default.
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