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- W2032711198 abstract "Solid phase epitaxial growth of electron beam deposited amorphous germanium on GaAs has been obtained. Contamination at the Ge/GaAs interface is observed to impede and even prevent epitaxy of the deposited Ge layer. Complete epitaxy of the Ge was obtained by thermal annealing (400 °C for 1 h) of layers deposited on in situ sputter cleaned GaAs substrates." @default.
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- W2032711198 title "Solid phase epitaxy of deposited amorphous Ge on GaAs" @default.
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- W2032711198 doi "https://doi.org/10.1063/1.95993" @default.
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