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• W2032804489 abstract "The authors present a new experimental technique for producing model two-dimensional systems subject to external fields of arbitrary symmetry and variable coupling strength. An aqueous suspension of colloidal microspheres is confined to a single layer between two quartz flats, on one of which a pattern of eroded features is etched using electron-beam lithography combined with plasma etching. By varying the depth of the etched features the strength of the electrostatic wall-particle forces can be adjusted smoothly. They demonstrate the feasibility of the method and discuss possible applications." @default.
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• W2032804489 date "1987-02-21" @default.
• W2032804489 modified "2023-09-30" @default.
• W2032804489 title "Programmed symmetry lowering in 2D colloids" @default.
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• W2032804489 doi "https://doi.org/10.1088/0305-4470/20/3/013" @default.
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