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- W2033079552 abstract "Ce papier concerne la diffusion de certains éléments des groupes III et V dans le silicium à la pression atmosphérique. Les trois éléments, gallium, bore et phosphore ont été étudiés en détail. Dés résultats quantitatifs sont donnés sur l'effet de protection d'une couche de silice, la témperature d'évaporation de l'impurité et la nature du gaz porteur. Les phénomènes d'oxydation et de réduction associés à la diffusion du gallium sont discutés, ainsi que l'affinité du bore pour l'oxyde de silicium. This paper deals with the diffusion of several elements from Groups III and V in silicon at atmospheric pressure. Gallium, boron and phosphorus have been considered in detail. Quantitative results are given on masking by a silicon dioxide layer, on the impurity evaporation temperature and the nature of the carrier gas. The oxidation and reduction phenomena associated with gallium diffusion are discussed, as well as the affinity of boron for silicon oxide. Diese Arbeit behandelt die Diffusion einiger Elemente der III. und V. Gruppe in Silizium bei Atmosphärendruck. Besonders Gallium, Bor und Phosphor werden betrachtet. Quantitative Ergebnisse werden angeführt über die Maskierung mit einer Siliziumdioxyd-Schicht, über die Verdampfungstemperatur der Verunreinigungen und über die Natur des Trägergases. Die in Verbindung mit der Gallium-Diffusion auftretenden Oxydations- und Reduktions-Phänomene werden besprochen, ebenso die Affinität des Bors zum Siliziumoxyd." @default.
- W2033079552 created "2016-06-24" @default.
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- W2033079552 date "1960-05-01" @default.
- W2033079552 modified "2023-10-04" @default.
- W2033079552 title "Sur la diffusion des éléments des colonnes III et V dans le silicium" @default.
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- W2033079552 doi "https://doi.org/10.1016/0038-1101(60)90043-5" @default.
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