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• W2033381255 abstract "This paper presents the limitation of the cast technique for silicon growth and the obstacle to reduce the dislocation density below 103 cm−2. The thermal stress induced dislocation density, independent of other dislocation sources, is determined and the result suggests that local dislocation densities as high as 104 cm−2 are readily introduced alone in the cooling period of the crystal growth. Areas of high residual strain and dislocation densities are identified and presented. The experimental results are correlated with numerical simulation based on a three-dimensional Haasen-Alexander-Sumino (HAS) model. The dislocation introduction is caused by an activation of different slip systems in different ingot areas." @default.
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• W2033381255 date "2014-12-01" @default.
• W2033381255 modified "2023-10-12" @default.
• W2033381255 title "Thermal stress induced dislocation distribution in directional solidification of Si for PV application" @default.
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• W2033381255 doi "https://doi.org/10.1016/j.jcrysgro.2014.09.017" @default.
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