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- W2033549315 abstract "We have investigated the structural and mechanical properties of polycrystalline Cr–Si–N thin films of different morphologies. The films were deposited by reactive magnetron sputtering at 510 K using two confocal targets of Cr and Si. The structure and mechanical properties of co-deposited Cr–Si–N films depend on their silicon content. Films with silicon content lower than 3 at.% are fcc Cr1−xSixN compounds with a maximum hardness of 22 GPa. On the contrary, films containing more than 3 at.% of silicon show the segregation of a SiNx amorphous phase and highly columnar morphology. These samples have low hardness values (14 GPa). The alternating deposition of CrN and a-SiNx layers disrupts this columnar structure and leads to nanocomposite films. The hardness of these films varies when the multilayer period is changed, i.e. the CrN crystallite size. A maximum hardness value (26 GPa) has been found for a nanocomposite structure composed of 4 nm CrN crystallites embedded in amorphous SiNx." @default.
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- W2033549315 date "2004-03-01" @default.
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- W2033549315 title "Mechanical properties of nanocomposite and multilayered Cr–Si–N sputtered thin films" @default.
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- W2033549315 doi "https://doi.org/10.1016/j.surfcoat.2003.10.121" @default.
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