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- W2033899145 abstract "Atomic force microscope (AFM)-based scanned probe oxidation (SPO) nanolithography has been carried out on an octadecyl-terminated Si(111) surface to create dot-array patterns under ambient conditions in contact mode. The kinetics investigations indicate that this SPO process involves three stages. Within the steadily growing stage, the height of oxide dots increases logarithmically with pulse duration and linearly with pulse voltage. The lateral size of oxide dots tends to vary in a similar way. Our experiments show that a direct-log kinetic model is more applicable than a power-of-time law model for the SPO process on an alkylated silicon in demonstrating the dependence of oxide thickness on voltage exposure time within a relatively wide range. In contrast with the SPO on the octodecysilated SiO2/silicon surface, this process can be realized by a lower voltage with a shorter exposure time, which will be of great benefit to the fabrication of integrated nanometer-sized electronic devices on silicon-based substrates. This study demonstrates that the alkylated silicon is a new promising substrate material for silicon-based nanolithography." @default.
- W2033899145 created "2016-06-24" @default.
- W2033899145 creator A5024255729 @default.
- W2033899145 creator A5044512586 @default.
- W2033899145 creator A5064481037 @default.
- W2033899145 creator A5067286202 @default.
- W2033899145 date "2006-05-11" @default.
- W2033899145 modified "2023-09-23" @default.
- W2033899145 title "Kinetics of Atomic Force Microscope-Based Scanned Probe Oxidation on an Octadecylated Silicon(111) Surface" @default.
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- W2033899145 doi "https://doi.org/10.1021/jp0553030" @default.
- W2033899145 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/16722741" @default.
- W2033899145 hasPublicationYear "2006" @default.
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