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- W2034004298 abstract "Polycrystalline thin films of Al, Fe and Ni have been implanted with CH4+ ions, and investigated by high voltage transmission electron microscopy (HVTEM) and selected area diffraction (SAD). It has been demonstrated that good quality glassy films of Al, uniformly amorphous over the entire implanted area, can be formed by graded implantation of CH4+ ions with the dose ranging between 8 × 1017−1 × 1018 ions/cm2. In the case of Fe and Ni, however, only partial transformation into the amorphous phase occurred. The stability of the glassy phases has been tested by annealing studies." @default.
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- W2034004298 date "1990-10-01" @default.
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- W2034004298 title "Metallic glass formation by CH4+ ion implantation into Al, Fe and Ni thin films" @default.
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- W2034004298 doi "https://doi.org/10.1016/0022-3093(90)90255-k" @default.
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