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• W2034004780 abstract "XPS and AFM have been used to investigate surface modifications produced by acrylic acid (AA) vapor plasma treatment of silicon (Si)(1 0 0) substrates and polyurethanes (PUs) membranes. XPS analyses of Si and PUs treated substrates at low plasma power (5–20 W) revealed the formation of a thin film on the surfaces, which chemically resembles the poly(acrylic acid) film conventionally synthesised. No signal of the Si substrate could be seen under these low plasma power applications on silicon. However, when the plasma power is higher than 30 W one can clearly see XPS silicon signatures. AFM measurements of silicon substrates treated with AA plasma at low power (5–20 W) showed the formation of a thin polymer film of about 220–55 nm thickness. Further, applications of high plasma power (30–100 W) displayed a marked difference from low plasma modifications and it was found sputtering of the silicon substrate. Pervaporation results of AA plasma treated PUs membranes revealed that the selectivity for the separation of methanol from methyl-t-butyl ether is higher at 100 W and 1 min treatment time, than the other conditions studied. This last finding is discussed concerning the surface modifications produced on plasma treated silicon substrates and PU membranes." @default.
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• W2034004780 date "2007-10-01" @default.
• W2034004780 modified "2023-09-24" @default.
• W2034004780 title "Study of the influence of the acrylic acid plasma parameters on silicon and polyurethane substrates using XPS and AFM" @default.
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• W2034004780 doi "https://doi.org/10.1016/j.apsusc.2007.07.060" @default.
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