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- W2034019493 abstract "In this paper, an oxygen‐insensitive degradable resist for UV‐nanoimprint is designed, comprising a polycyclic degradable acrylate monomer, 2,10‐diacryloyloxymethyl‐1,4,9,12‐tetraoxaspiro [4.2.4.2] tetradecane (DAMTT), and a multifunctional thiol monomer pentaerythritol tetra(3‐mercaptopropionate) (PETMP). The resist can be quickly UV‐cured in the air atmosphere and achieve a high monomer conversion of over 98%, which greatly reduce the adhesion force between the resist and the soft mold. High conversion, in company with an adequate Young's modulus (about 1 GPa) and an extremely low shrinkage (1.34%), promises high nanoimprint resolution of sub‐50 nm. The cross‐linked resist is able to break into linear molecules in a hot acid solvent. As a result, metallic patterns are fabricated on highly curved surfaces via the lift off process without the assistance of a thermoplastic polymer layer. image" @default.
- W2034019493 created "2016-06-24" @default.
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- W2034019493 date "2014-09-03" @default.
- W2034019493 modified "2023-10-18" @default.
- W2034019493 title "An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by UV-Nanoimprint Lithography" @default.
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- W2034019493 doi "https://doi.org/10.1002/marc.201400251" @default.
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