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• W2034046429 endingPage "382" @default.
• W2034046429 startingPage "339" @default.
• W2034046429 abstract "Abstract As a result of considerable progress in microfabrication technology for ultra-large scale integration (ULSI), it has become necessary to control oxide formation on an atomic scale in order to produce defect-free SiO2/Si interfaces. However, the possibility of forming an atomically flat interface by oxidizing an atomically flat silicon surface without introducing structural defects is not yet clarified. In this article the present understanding of chemical structures of SiO2/Si interfaces and initial stage of oxidation of silicon surfaces are reviewed." @default.
• W2034046429 created "2016-06-24" @default.
• W2034046429 creator A5035724354 @default.
• W2034046429 date "1995-01-01" @default.
• W2034046429 modified "2023-09-25" @default.
• W2034046429 title "Chemical Structures of the SiO₂Si Interface" @default.
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