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- W2034080296 abstract "While electron-based structural probes have been extensively applied to low-pressure film growth techniques such as evaporation, similar studies on sputter deposition have been hindered by the relatively high gas pressure (1–10 mT) inherent to the technique. Because x rays scatter more weakly than electrons the absorption in the ambient is not significant and diffraction from the growing film can be observed if a sufficiently bright source of x rays is used. We have developed a chamber which combines features of an ultrahigh-vacuum sputter-deposition system with the goniometric adjustments and the x-ray windows of a scattering chamber. A description of its design and recent results are presented." @default.
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- W2034080296 date "1992-01-01" @default.
- W2034080296 modified "2023-09-24" @default.
- W2034080296 title "An apparatus for studying sputter deposition with x rays" @default.
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- W2034080296 doi "https://doi.org/10.1063/1.1143117" @default.
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