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- W2034105649 abstract "We studied phase shifter defect repair techniques which use conventional mask repair tools. This paper describes two repair techniques applicable to phase shifter residue defects on the etch-stop layer of a quartz substrate. These new techniques, which use a conventional Nd:YAG laser and a Focused Ion Beam (FIB) are beam-on-edge and absorber implantation. Beam-on-edge repair removes phase shifter pin-dots by optimally applying an Nd:YAG laser under conventional mask repair conditions. Absorber implantation repair optimizes phase shifter form combining FIB and Nd:YAG laser tools." @default.
- W2034105649 created "2016-06-24" @default.
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- W2034105649 date "1994-11-03" @default.
- W2034105649 modified "2023-09-23" @default.
- W2034105649 title "Application of conventional defect repair technique to phase-shifting masks" @default.
- W2034105649 doi "https://doi.org/10.1117/12.191950" @default.
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