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- W2034129197 abstract "The attributes and limitations of several chemical-vapor-deposited TiN chemistries are discussed: TiCl4 + NH3 (amonia) + (CH3) HNNH2 (methylhydrazine, MH), or (CH3)3CH2N (tert-butylamine, TBA) and NH3 + Ti(N(CH3)2)4 (tetrakis dimethylamido-titanium, DIMAT). Problems associated with native oxide removal and surface cleaning are also discussed, along with results from integrating preclean and chemical vapor deposition in a clustered single-wafer platform." @default.
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- W2034129197 date "1969-06-01" @default.
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- W2034129197 title "On distinguishing the geometric isomers of nitro-ammine complexes" @default.
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- W2034129197 doi "https://doi.org/10.1016/0020-1650(69)80124-8" @default.
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