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- W2034141633 abstract "For low-k1 lithography, high accurate control of the development process is required. For that purpose, low- impact dispensing is one of the most effective approaches. In that process, development time differs between start and end position of nozzle-scan. To reduce the time lag, the nozzle-scan-speed of 140mm/s was selected. But critical dimensions (CD) offset that depends on scan-direction was detected. From the results of the CD and dissolution performances for three resists, we found that the pull-back flow of the developer was the main cause of the CD offset. Thus, it is important that the developer does not flow by its pull-back-force. By observing and analyzing the flow of the dissolution product with a video camera, the best condition of the scan-speed (=60 mm/s) was selected. Under this nozzle-scan condition, the dissolution rates did not depend on the scan-direction of the dispenser-nozzle. As a result, the small CD offset could be observed for 200nm L&S patterns." @default.
- W2034141633 created "2016-06-24" @default.
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- W2034141633 date "2001-08-24" @default.
- W2034141633 modified "2023-09-23" @default.
- W2034141633 title "Dissolution performance of device pattern with low-impact development" @default.
- W2034141633 doi "https://doi.org/10.1117/12.436900" @default.
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