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• W2034157149 abstract "A narrow band KrF excimer laser system for lithography has been developed. Its durability has been proved up to 2 billion shots that correspond to one year operation in mass production line. The system has kept the average power of 6W with the power stability within +- 3% and the spectral line-width 1.2 pm (FWHM) with the wavelength stability within +- 0.2 pm. The integration of the spectrum has indicated that 95% of the spectral energy lay inside 4.6 pm band during 2 billion shots" @default.
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• W2034157149 date "1992-06-01" @default.
• W2034157149 modified "2023-09-23" @default.
• W2034157149 title "Narrow band KrF excimer laser for mass production of ULSI ICs" @default.
• W2034157149 doi "https://doi.org/10.1117/12.130349" @default.
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