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- W2034194166 abstract "This paper describes two methods of making narrow photoresist frame patterns to fabricate the top pole of writing elements. First, a KrF excimer laser stepper was used to expose a thick photoresist for fabrication of top poles. Second, the tri-layer resist frame method using reactive ion etching (RIE) was examined for fabricating the resist frame. Thick photoresist could be resolved by the KrF excimer laser stepper. Furthermore, the off-axis (annular) illumination exposure method could increase the depth of focus. By using Ta hard mask layer for the tri-layer resist frame method, we were able to make a 0.25-μm wide frame." @default.
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- W2034194166 date "2001-01-01" @default.
- W2034194166 modified "2023-09-25" @default.
- W2034194166 title "Narrow Write Track Fabrication Processing of Magnetic Heads." @default.
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- W2034194166 doi "https://doi.org/10.3379/jmsjmag.25.631" @default.
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