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• W2034235603 abstract "Thin films of zirconia–carbon (ZrO2−x–C) were deposited by RF magnetron sputtering, on both polycarbonate and cemented-WC substrates. Two separate targets of monoclinic ZrO2 and graphite were used and a composition range was selected from 0 to ∼30 at.% carbon. The C-containing films resulted in a composite structure, which consisted of a zirconia phase coexisting with an amorphous carbon phase. A tetragonal zirconia phase was found in films containing 10–30 at.% carbon, while films of pure zirconia grew in the monoclinic phase. The tetragonal phase of zirconia coincided with the presence of compressive internal stresses in the films, which increased with increasing C content. As a consequence of the microstructure induced by the presence of carbon, the ZrO2−x–C films resulted in a stronger surface hardening of the polymeric substrates than the pure zirconia films did." @default.
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• W2034235603 date "2001-02-01" @default.
• W2034235603 modified "2023-09-24" @default.
• W2034235603 title "Carbon effect on the phase structure and the hardness of RF sputtered zirconia films" @default.
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• W2034235603 doi "https://doi.org/10.1016/s0040-6090(00)01682-5" @default.
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