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• W2034248928 abstract "The paper investigates the charging mechanisms of plasma enhanced chemical vapor deposition (PECVD) silicon nitride films, which are used in MEMS capacitive switches. The assessment has been carried out in metal–insulator–metal (MIM) capacitors with symmetric metal contacts and film thicknesses from 100 nm to 500 nm, with the aid of thermally stimulated depolarization currents (TSDC) method. Various polarization fields with intensities from 20 kV/cm to 1 MV/cm and of both field polarities were applied and the stored charge measured in the external circuit was calculated. The decomposition of TSDC spectra revealed the contribution of discrete polarization mechanisms, attributed to dipolar and space charge polarization. In low field intensities the TSDC spectra were attributed to domination of dipolar polarization and in high fields to space charge polarization." @default.
• W2034248928 created "2016-06-24" @default.
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• W2034248928 date "2012-02-01" @default.
• W2034248928 modified "2023-10-14" @default.
• W2034248928 title "Investigation of silicon nitride charging" @default.
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• W2034248928 doi "https://doi.org/10.1016/j.mee.2011.05.012" @default.
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