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- W2034283229 abstract "Recently we have developed and reported some novel non-ionic photoacid generators (PAGs) which generate astrong acid (perfluorobutanesulfonic acid) by light irradiation and is applicable to chemically amplified ArFphotoresist, such as 2-[2,2,3,3,4,4,5,5-octafluoro-1-(nonafluorobutylsulfonyloxyimino)-pentyl]-fluorene (ONPF), 2-[2,2,3,3,4,4,4-heptafluoro-1-(nonafluorobutylsulfonyloxyimino)-butyl]-fluorene (HNBF) and so on. Here thelithographic property of ONPF in some ArF model formulations was evaluated under 193 nm dry and immersionexposure comparing one of the most typical ionic PAGs, triphenylsulfonium perfluorobutanesulfonate (TPSPB), onlithographic application-relevant properties, e.g. exposure latitude, line edge roughness (LER) and so on, by top-downview SEM observation. 80 nm line and space (L/S) patterning was successfully conducted. Additionally weinvestigated the striation issue with ONPF when the matrix polymer of resist was changed. It was revealed that ONPFshowed better coating property in a copolymer of g-butyrolactone methacrylate, 2-ethyladamantyl methacrylate andhydroxyladamantyl methacrylate than in a copolymer of d-methacryloyloxynorbornane butyrolactone in lactone unit." @default.
- W2034283229 created "2016-06-24" @default.
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- W2034283229 date "2007-03-16" @default.
- W2034283229 modified "2023-09-23" @default.
- W2034283229 title "Non-ionic photoacid generators for chemically amplified resists: evaluation results on the application-relevant properties" @default.
- W2034283229 doi "https://doi.org/10.1117/12.708399" @default.
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