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- W2034349554 abstract "This is a preliminary report on the nanostructure and its evolution, step-coverage, and dielectric properties of sub-300 Å (Ba x ,Sr 1- x )TiO 3 films. The (001)-oriented polycrystalline films were deposited at 50–70 Å/min by metal-organic chemical vapor deposition (MOCVD) on (111) Pt-passivated Si substrates of 8-inch diameter. From the detailed nonstructural characterization of (Ba 0.64 ,Sr 0.36 )TiO 3 films, the orientation, cation stoichiometry, and an alternative but plausible mechanism of growth and the origin of roughness are forwarded. Additionally, the step-coverage in 2:1 to 5:1 aspect-ratio trenches, coupled with the frequency/voltage dependence of the dielectric properties of (Ba x ,Sr 1- x )TiO 3 films are reported. A 275 Å (Ba 0.64 ,Sr 0.36 )TiO 3 film exhibited a dispersionless dielectric permittivity and loss tangent of 260 and 0.003, respectively, and the permittivity ( ε r =340) of a 300 Å (Ba 0.5 ,Sr 0.5 )TiO 3 film reduced by 53% at a dc-bias of 3 V." @default.
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- W2034349554 date "2001-05-01" @default.
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- W2034349554 title "Sub-300 Å (Ba<sub>x</sub>,Sr<sub>1-x</sub>)TiO<sub>3</sub> Films by Metal Organic Chemical Vapor Deposition: Nanostructure, Step Coverage, and Dielectric Properties" @default.
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