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- W2034352968 abstract "Abstract We have prepared Ga-doped a-Si films by PECVD, by the addition of metalorganic Ga compounds to the silane. We give here a first account on electrical, optical and structural properties. The samples were prepared with the deposition parameters within the usual range. With increasing Ga content the room temperature dark conductivity of a-Si first drops to the value of 8×10−12 Ω −1 cm−1 which is typical for compensated a-Si and then raises similar to the boron doping case. There is, however, an important difference: Since Ga is a metal, metallic conductivity can be attained at large Ga concentration." @default.
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- W2034352968 date "1987-12-01" @default.
- W2034352968 modified "2023-10-16" @default.
- W2034352968 title "Electronic properties of Ga-doped amorphous silicon" @default.
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- W2034352968 doi "https://doi.org/10.1016/0022-3093(87)90151-7" @default.
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