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- W2034359570 abstract "Repetitive bursts of continuous wave plasma polymerization on the minute time scale are found to lead to the deposition of well-defined polymeric nanospheres. This unique mode of film growth is attributed to a high level of monomer replenishment in combination with minimal secondary reaction processes (e.g., fragmentation, cross-linking, and etching). In the case of the 1H,1H,2H,2H-perfluorooctyl acrylate precursor, high contact angle (super-hydrophobic) surfaces are produced by this method." @default.
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- W2034359570 date "2002-10-17" @default.
- W2034359570 modified "2023-10-17" @default.
- W2034359570 title "Pulsed Plasma Deposition of Super-Hydrophobic Nanospheres" @default.
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- W2034359570 doi "https://doi.org/10.1021/cm011600f" @default.
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