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- W2034365259 abstract "This work presents a novel method for determining bulk etch rate of CR-39 during prolonged etching by masking the surface with a ferrofluidic film held in position by magnetostatic forces. The CR-39 etching conditions were 6.25 M NaOH solution for 24 h at temperatures ranging from 50 to 80 °C. After etching, the heights of the resulting un-etched plateaus were measured using a Talyscan 150 profilometer. The removed layer thicknesses ranged from 12 to 85 μm, giving corresponding bulk etch rates in the range 0.5–3.54 μm/h." @default.
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- W2034365259 date "2009-02-01" @default.
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- W2034365259 title "Ferrofluidic masking of solid state nuclear track detectors during etching" @default.
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- W2034365259 doi "https://doi.org/10.1016/j.radmeas.2009.01.007" @default.
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