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• W2034371303 abstract "(H2SiCH2)2 1 wird durch Umsetzung von (Cl2SiCH2)2 mit LiAlH4 zugänglich. Bei der Umsetzung von 1 mit Cl2 oder Br2 ist die SiH-Halogenierung gegenüber der Ringspaltung so stark bevorzugt, daß sich nacheinander alle Verbindungen von 1-Monochlor-1,3-disilacyclobutan bis zum (X2SiCH2)2 (X = Cl, Br) bilden. Die Beständigkeit des 1,3-Disilacyclobutangerüstes gegen HBr bzw. Br2 steigt mit der Elektronegativität der Si-Substituenten. So wird (Cl2SiCH2)2 weder von Br2 noch HBr gespalten. Während z. B. [H(C6H5)SiCH2]2 mit Brom zu [Br(C6H5) SiCH2]2 reagiert, bildet es mit HBr das meH(C6H5)SiCH2SiBr(C6H5)H (me = CH3). In [me(C6H5)SiCH2]2 wird der Ring sowohl von Br2 als auch von HBr gespalten. Es werden die 1H-, 29Si- und 13C-NMR-Spektren angegeben. Formation of Organosilicon Compounds. 66. (H2SiCH2)2 and Si-substituted Derivatives (H2SiCH2)2 1 is formed in the reaction of (Cl2SiCH2)2 with LiAlH4. In 1, the halogenation of the SiH bond is so much preferred compared to the ring cleavage reaction, that 1 reacts with Cl2 or Br2 to form successively all compounds form 1-monochlor-1,3-disilacyclobutane to (X2SiCH2)2 (X = Cl, Br). The stability of the 1,3-disilacyclobutane skeleton towards HBr or Br2 increases as the electronegativity of the Si-substituents increases. Thus, (Cl2SiCH2)2 is cleaved neither by HBr nor by Br2, whereas e. g. [H(C6H5)SiCH2]2 reacts to [Br(C6H5)SiCH2]2 with Br2, but yields meH(C6H5)SiCH2SiBr(C6H5)H (me = CH3) with HBr. In [me(C6H5)SiCH2]2, the four-membered ring is cleaved by Br2 as well as by HBr. The 1H-, 29Si- and 13C-n.m.r. data are reported." @default.
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• W2034371303 date "1976-09-01" @default.
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• W2034371303 title "Bildung siliciumorganischer Verbindungen. 66. (H2Si?CH2)2 und Si-substituierte Derivate" @default.
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• W2034371303 doi "https://doi.org/10.1002/zaac.19764260105" @default.
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