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- W2034389541 abstract "Structures of argon ion sputter-deposited TiSe2 films have been studied by electron microscopy. The as-deposited films showed typical diffraction haloes. The measured density of the film showed that the as-deposited film has a composition corresponding to TiSe2. High resolution electron microscopy images showed crossed fringe structure of the order of 1 nm in size. Therefore, it may be concluded that the as-deposited film was composed of TiSe2 micro-crystallites. By irradiation of the as-deposited film with an electron beam of the order of 100 A/cm2, the film crystallized to TiSe2 crystallites of a few nm in size. By further irradiation with an intense electron beam, they showed a change and growth to a grain size of a few tens of nm of Ti5Se8. These Ti5Se8 films gradually changed to the TiSe1.5 crystals." @default.
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- W2034389541 date "1988-09-01" @default.
- W2034389541 modified "2023-09-27" @default.
- W2034389541 title "Studies on the structure and the crystallization process of ion sputtered TiSe2 films" @default.
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- W2034389541 doi "https://doi.org/10.1016/0169-4332(88)90346-7" @default.
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