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- W2034390900 abstract "Chemical Amplification Resists (CAR) are now widely used in optical lithography since the introduction of the deep UV era. One advantage of the CARs is also their full compatibility with electron beam writing. This paper is focused on the development work of a negative tone resist. The influence of resist compounds such as polymer matrix composition and PAG size on diffusion and ultimate resolution is detailed. Finally the pattern transfer capabilities of a 30 nm isolated line into a polysilicon layer is presented." @default.
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- W2034390900 date "2001-08-24" @default.
- W2034390900 modified "2023-09-26" @default.
- W2034390900 title "Resist composition effects on ultimate resolution of negative-tone chemically amplified resists" @default.
- W2034390900 doi "https://doi.org/10.1117/12.436854" @default.
- W2034390900 hasPublicationYear "2001" @default.
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