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- W2034647957 abstract "Here, we present a study to outline the design space and trade-offs for high PVCR, low-voltage, low-current tunnel diodes with best results for peak currents and voltages being 4.3 nA/mum2, 50 mV with PVCR of 15, and demonstrate a fabrication process yielding submicron interband tunnel diodes for the first time. The PVCR of submicron diodes is observed to degrade for submicron device mesas indicating the need for passivation to maintain the PVCR." @default.
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- W2034647957 date "2008-06-01" @default.
- W2034647957 modified "2023-09-22" @default.
- W2034647957 title "Structural Sensitivity of Interband Tunnel Diodes for SRAM" @default.
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- W2034647957 doi "https://doi.org/10.1109/drc.2008.4800736" @default.
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