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• W2034651398 abstract "As IC process geometries scale down to the nanometer era, the industry faces severe challenges of manufacturing limitations. For the imperfect manufacturing process, physical design for manufacturability has played an essential role in resolution and thus yield enhancement to guarantee yield. In this paper, we introduce three major challenges arising from the nanometer process technology and survey major existing techniques for handling the challenges in physical design for manufacturability." @default.
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• W2034651398 date "2011-08-01" @default.
• W2034651398 modified "2023-09-25" @default.
• W2034651398 title "Recent research development in physical design for manufacturability" @default.
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• W2034651398 doi "https://doi.org/10.1109/mwscas.2011.6026536" @default.
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