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- W2034714934 abstract "SGOI materials were fabricated by thermal dry oxidation of epitaxial H-ion implanted SiGe layers on SOI wafers. The hydrogen implantation was found to delay the oxidation rate of SiGe layer and to decrease the loss of Ge atoms during oxidation. Further, the H implantation did not degrade the crystallinity of SiGe layer during fabrication of the SGOI." @default.
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- W2034714934 date "2005-06-01" @default.
- W2034714934 modified "2023-10-01" @default.
- W2034714934 title "Fabrication of SGOI material by oxidation of an epitaxial SiGe layer on an SOI wafer with H ions implantation" @default.
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- W2034714934 doi "https://doi.org/10.1016/j.nimb.2005.02.007" @default.
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