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- W2034719625 abstract "Evaluation results about area scaling capabilities of various SRAM margin-assist techniques for random VT variability issues are described. Various efforts to address these issues by not only the cell topology changes from 6T to 8T and 10T but also incorporating multiple voltage-supply for the cell terminal biasing and timing sequence controls of read and write are comprehensively compared in light of an impact on the required area overhead for each design solution given by ever increasing VT variation (σVT). Two different scenarios which hinge upon the EOT (Effective Oxide Thickness) scaling trend of being pessimistic and optimistic, are assumed to compare the area scaling trends among various SRAM solutions for 32 ㎚ process node and beyond. As a result, it has been shown that 6T SRAM will be allowed long reign even in 15 ㎚ node if σVT can be suppressed to ＜ 70 ㎷ thanks to EOT scaling for LSTP (Low Standby Power) process." @default.
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- W2034719625 date "2009-03-31" @default.
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- W2034719625 title "A Scaling Trend of Variation-Tolerant SRAM Circuit Design in Deeper Nanometer Era" @default.
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- W2034719625 doi "https://doi.org/10.5573/jsts.2009.9.1.037" @default.
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