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- W2034723650 abstract "Abstract An 16 O 2 -oxidised Si(100) surface, covered with 15 nm Cu particles, was oxidised in 18 O 2 and subsequently reduced in H 2 . After reduction, there still was a significant amount of 18 O present in the sample. In this paper we concerned ourselves with revealing the origin of this remaining 18 O. By performing some strategic experiments we found that there was no significant contribution to the residual 18 O in the sample due the following processes: oxidation of the substrate to a further extent, the remain of an 18 O-adlayer on the sample after reduction, and reactions of reduction products with the substrate. The remaining 18 O was caused by self-diffusion of oxygen atoms: maximum entropy was achieved by mixing 16 O atoms in the substrate with 18 O located inside the copper particles. We drew this conclusion from the fact that 18 O-exchange also occurred during vacuum annealing of an oxidised sample, which is impossible in the case of the other proposed mechanisms. Also, 18 O could be extracted from a metallic Cu 2 SiO sample through 16 O 2 -oxidation, annealing of the sample in vacuo, and subsequent reduction of the sample." @default.
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- W2034723650 date "1996-07-01" @default.
- W2034723650 modified "2023-09-27" @default.
- W2034723650 title "18O-exchange with the substrate during 18O oxidation of Cu particles supported on 16O-oxidised Si(100)" @default.
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- W2034723650 doi "https://doi.org/10.1016/0169-4332(96)00104-3" @default.
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