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- W2034778170 abstract "We have found that nitrogen atoms are released very rapidly from ultrathin SiOxNy films (∼2.6 nm) during RBS measurement with 500 keV He+ ions. The release behavior strongly depends on the preparation technique of the SiOxNy films. There is no release from the film prepared by thermal nitridation of SiO2, while 80% of the nitrogen atoms are released from the film prepared by plasma nitridation at a fluence of 1×1016 cm−2. The release cross-section for plasma SiOxNy films is of the order of 10−16 cm2. This large cross-section cannot be explained by a simple recoil mechanism. The nitrogen release is also observed under irradiation with 5–10 keV electrons though the cross-section is of the order of 10−19 cm2. These findings suggest that the observed nitrogen release is an electronic excitation induced process." @default.
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- W2034778170 date "2002-05-01" @default.
- W2034778170 modified "2023-09-27" @default.
- W2034778170 title "Release of nitrogen from SiOxNy films during RBS measurement" @default.
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